Metalorganic vapor-phase epitaxy of room-temperature, low-threshold InGaAs/AlInAs quantum cascade lasers

Citation:

D Bour, M Troccoli, F. Capasso, S Corzine, A Tandon, D Mars, and G Hofler. 2004. “Metalorganic vapor-phase epitaxy of room-temperature, low-threshold InGaAs/AlInAs quantum cascade lasers.” JOURNAL OF CRYSTAL GROWTH, 272, 1-4, Pp. 526-530.
2004_bour_et_al.pdf280 KB

Abstract:

We have grown 30-stage AtInAs-GaInAs quantum cascade laser structures by low-pressure metalorganic vaporphase epitaxy (MOVPE). The growth rate for the active region was set very low (0.1 nm/s), and growth stops were employed at all interfaces. The devices were operated pulsed at room temperature, with a threshold current density of 2.8 kA/cm(2), a lasing wavelength of 7.6mum, and a peak power of 150mW. CW operation was achieved up to a temperature of 180 K. These characteristics compare favorably with MBE-grown QC lasers of similar structure. (C) 2004 Elsevier B.V. All rights reserved.

Notes:

12th International Conference on Metalorganic Vapor Phase Epitaxy (ICMOVPE 12), Lahina, HI, MAY 30-JUN 04, 2004
Last updated on 05/29/2020